OLIN
AbandonedCombined Mark
•
Key Information
Ownership
OC
Owner Name
Type: Organization / Corporation
Address
190 Carondelet Plaza Suite 1530
St. Louis, MO 63105
Critical Dates
First Use Date
Not filed yet
Filing Date
Jun 4, 2015
Publication Date
Jul 26, 2016
Abandonment Date
Oct 21, 2019
Mark Descriptions
Goods
Class 1
Chlorine; hydrochloric acid; potassium hydroxide; sodium hydroxide; sodium hypochlorite; hydrogen; sodium chloride; sulfuric acid; ethylene dichloride; vinyl chloride monomer; acetone; cumene; phenol; allyl chloride; epichlorohydrin; bisphenol A; unprocessed synthetic novolac resins...
Class 17
semi-processed synthetic novolac resins; semi-processed epoxy resins including semi-processed liquid epoxy resins and semi-processed advanced epoxy resins; semi-processed epoxy novolac resins; semi-processed synthetic resins
Mark Elements
Text Mark
OLIN
Category
Trademark
Standard Characters
No
Color Claim
No
Drawing/Image Description
The mark consists of the stylized word "OLIN" with a diamond design and two arcs forming the segmented letter "O".
Design Search Codes
26.07.01
Diamonds with plain multiple line border26.07.28
Diamond shapes (miscellaneous overall shape)27.03.01
Geometric figures forming letters or numerals, including punctuationData source: USPTO TSDR
View on USPTO websiteTrademark Timeline
Filing Date
Publication Date
Abandonment Date
USPTO Records
No documents found for this trademark.
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