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Inpria Corporation

3 Marks
Corp.
First Filed:Dec 23, 2016Latest Filed:Apr 14, 2023Address:1100 NE Circle Blvd., Suite 360, Corvallis, OR 97330

Portfolio Overview

Registered
3(100%)

Top Classes

Class 1
Industrial Chemicals & Adhesives
3(100%)

TTAB Proceedings

No litigation activity

Top Firms

Christensen, Fonder, Dardi &...(Apr 2023)
3

Trademark Portfolio

3 results

(current & previous marks)

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Filed
Registered
Last Activity
INPRIA
INPRIA
Trademark
Combined
REGISTERED
Owner:
Serial:97889694
Filed:Apr 14, 2023
Classes:1
Registration:7374134
Registered:Apr 30, 2024
Goods & Services
Photoresists in the nature of chemicals; solutions of chemicals useful to form metal oxide thin films; solutions of chemicals for deposition of metal oxide thin films for use as hard mask layers; metal oxides for use in a photoresist process, namely, solutions of metal oxides; developers, namely, photoresist developers for use with photoresists in the nature of chemicals; underlayer materials in the nature of chemicals, namely, chemical compositions for use with photoresist patterning
I
I
Trademark
Combined
REGISTERED
Owner:
Serial:97887688
Filed:Apr 13, 2023
Classes:1
Registration:7672708
Registered:Jan 28, 2025
Goods & Services
Photoresists in the nature of chemicals; solutions of chemicals useful to form metal oxide thin films; solutions of chemicals for deposition of metal oxide thin films for use as hard mask layers; metal oxides for use in a photoresist process, namely, solutions of metal oxides; developers, namely, photoresist developers for use with photoresists in the nature of chemicals; underlayer materials in the nature of chemicals, namely, chemical compositions for use with photoresist patterning
INPRIA
INPRIA
Trademark
Word
REGISTERED
Owner:
Serial:87279930
Filed:Dec 23, 2016
Classes:1
Registration:5561775
Registered:Sep 11, 2018
Goods & Services
Photoresists in the nature of chemicals; solutions of chemicals useful to form metal oxide thin films; solutions of chemicals for deposition of metal oxide thin films for use as hard mask layers; metal oxides for use in a photoresist process, namely, solutions of metal oxides; developers, namely, photoresist developers for use with photoresists in the nature of chemicals; underlayer materials in the nature of chemicals, namely, chemical compositions for use with photoresist patterning

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