LASERTEC CORPORATION

Optical inspection apparatus for semi-conductor materials and elements; semiconductor photomask phase-shift measuring apparatus; semiconductor photomask transmittance measuring apparatus; apparatus and instruments for measuring semiconductor photomask phase shifting amounts; semi-conductor testing machines and instruments; electron microscopes; optical semiconductor defect detectors; testing apparatus not for medical purposes, namely, semiconductor testing apparatus; precision measuring apparatus for measuring defects in semiconductor photomasks

Optical inspection apparatus for semi-conductor materials and elements; semiconductor photomask optical inspection apparatus; imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor photomasks; semiconductor photomask blanks optical inspection apparatus; imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor photomask blanks; semiconductor wafer optical inspection apparatus; imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor wafer; semi-conductor testing machines and instruments; photomask blanks defect detectors; testing apparatus not for medical purposes, namely, semiconductor testing apparatus; precision measuring apparatus for defects of photomask blanks

GaN semiconductor wafer optical inspection apparatus which is comprised of a confocal optical device and a display device, and which is used in manufacturing process of semiconductor wafer or semiconductor devices and for research and development of semiconductor wafer

Defect repairing machines for photomasks for semiconductors; defect repairing machines for reticles for semiconductors; defect repairing machines for wafers for semiconductors; defect repairing machines for photomasks for flat panel displays; defect repairing machines for photomask blanks for flat panel displays | Semiconductor photomask optical inspection apparatus; analyzing apparatus, namely, optical inspection apparatus for defect of photomasks for semiconductors; semiconductor photomask pattern optical inspection apparatus; semiconductor photomask pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor photomask pattern; semiconductor photomask imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor photomask; semiconductor photomask phase-shift measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask phase-shift; semiconductor photomask transmittance measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask transmittance; apparatus and instruments for measuring semiconductor photomask phase shifting amount, namely, optical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask phase shifting amount; semiconductor reticle optical inspection apparatus; analyzing apparatus, namely, optical inspection apparatus for defect of semiconductor reticles; semiconductor reticle pattern optical inspection apparatus; semiconductor reticle pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor reticle pattern; semiconductor reticle imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor reticle; semiconductor wafer optical inspection apparatus; semiconductor wafer measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor wafer; semiconductor wafer imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor wafer; semiconductor wafer edge optical inspection apparatus; analyzing apparatus, namely, optical inspection apparatus for defect of wafers for semiconductors; semiconductor photomask blanks optical inspection apparatus; semiconductor photomask blanks imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor photomask blanks; optical inspection apparatus for defect of flat panel display photomasks; optical inspection apparatus for defect of flat panel display photomask pattern; flat panel display photomask pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on flat panel display photomask pattern; optical inspection apparatus for defect of flat panel display photomask blanks; pellicle optical inspection apparatus for photomasks for flat panel displays; pellicle mounting apparatus, namely, optical inspection apparatus with the capability of mounting pellicles on photomasks for flat panel displays; confocal microscopes; laser microscopes; computer peripheral devices; optical inspection systems for in-suit visualizing of electro-chemical reactions comprising optical inspection apparatus for semi-conductor materials and elements; semi-conductor testing machines and instruments; electron microscopes; semiconductor defect detectors; testing apparatus not for medical purposes, namely, semiconductor testing apparatus; precision crystallographic measuring apparatus; data sets, downloadable, in the field of semiconductors; computer software, recorded, for operating semiconductor photomask, reticle or pellicle optical inspection apparatus; computer software applications, downloadable, for operating semiconductor photomask, reticle or pellicle optical inspection apparatus; computer hardware; computer programs, downloadable, for operating semiconductor photomask, reticle or pellicle optical inspection apparatus

Defect repairing machines for photomasks for semiconductors; defect repairing machines for reticles for semiconductors; defect repairing machines for wafers for semiconductors; defect repairing machines for photomasks for flat panel displays; defect repairing machines for photomask blanks for flat panel displays | Semiconductor photomask optical inspection apparatus; analyzing apparatus, namely, optical inspection apparatus for defect of photomasks for semiconductors; semiconductor photomask pattern optical inspection apparatus; semiconductor photomask pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor photomask pattern; semiconductor photomask imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor photomask; semiconductor photomask phase-shift measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask phase-shift; semiconductor photomask transmittance measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask transmittance; apparatus and instruments for measuring semiconductor photomask phase shifting amount, namely, optical measurement system comprised of optical inspection apparatus for measurement of semiconductor photomask phase shifting amount; semiconductor reticle optical inspection apparatus; analyzing apparatus, namely, optical inspection apparatus for defect of semiconductor reticles; semiconductor reticle pattern optical inspection apparatus; semiconductor reticle pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor reticle pattern; semiconductor reticle imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor reticle; semiconductor wafer optical inspection apparatus; semiconductor wafer measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor wafer; semiconductor wafer imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor wafer; semiconductor wafer edge optical inspection apparatus; analyzing apparatus, namely, optical inspection apparatus for defect of wafers for semiconductors; semiconductor photomask blanks optical inspection apparatus; semiconductor photomask blanks imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor photomask blanks; optical inspection apparatus for defect of flat panel display photomasks; optical inspection apparatus for defect of flat panel display photomask pattern; flat panel display photomask pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on flat panel display photomask pattern; optical inspection apparatus for defect of flat panel display photomask blanks; pellicle optical inspection apparatus for photomasks for flat panel displays; pellicle mounting apparatus, namely, optical inspection apparatus with the capability of mounting pellicles on photomasks for flat panel displays; confocal microscopes; laser microscopes; computer peripheral devices; optical inspection systems for in-suit visualizing of electro-chemical reactions comprising optical inspection apparatus for semi-conductor materials and elements; semi-conductor testing machines and instruments; electron microscopes; semiconductor defect detectors; testing apparatus not for medical purposes, namely, semiconductor testing apparatus; precision crystallographic measuring apparatus; data sets, downloadable, in the field of semiconductors; computer software, recorded, for operating semiconductor photomask, reticle or pellicle optical inspection apparatus; computer software applications, downloadable, for operating semiconductor photomask, reticle or pellicle optical inspection apparatus; computer hardware; computer programs, downloadable, for operating semiconductor photomask, reticle or pellicle optical inspection apparatus

Optical inspection apparatus for semi-conductor materials and elements; Semiconductor photomask optical inspection apparatus; semiconductor photomask imaging apparatus, namely, optical imaging apparatus for semiconductor photomask; semiconductor reticle optical inspection apparatus; semiconductor reticle imaging apparatus, namely, optical imaging apparatus for semiconductor reticle; semiconductor pellicle optical inspection apparatus; semiconductor pellicle imaging apparatus, namely, optical imaging apparatus for semiconductor pellicle; semi-conductor testing machines and instruments; electron microscopes; semiconductor defect detectors; testing apparatus not for medical purposes, namely, semiconductor testing apparatus; precision measuring apparatus for defects of photomasks, reticles or pellicles; data sets, downloadable, in the field of semiconductors; computer software, recorded, for operating semiconductor photomasks, reticles or pellicles inspection apparatus; computer software applications, downloadable, for operating semiconductor photomasks, reticles or pellicles inspection apparatus; computer hardware; computer programs, downloadable, for operating semiconductor photomasks, reticles or pellicles inspection apparatus

Semiconductor photomask optical inspection apparatus; semiconductor photomask imaging apparatus, namely, optical imaging apparatus for semiconductor photomask; semiconductor reticle optical inspection apparatus; semiconductor reticle imaging apparatus, namely, optical imaging apparatus for semiconductor reticle; semiconductor photomask blanks optical inspection apparatus; semiconductor photomask blanks imaging apparatus, namely, optical imaging apparatus for semiconductor photomask blanks; optical inspection apparatus for semi-conductor materials and elements; semi-conductor testing machines and instruments; electron microscopes; semiconductor defect detectors; material testing instruments and machines, namely, metal strength testing machines; testing apparatus not for medical purposes, namely, semiconductor testing apparatus; precision measuring apparatus for defects of photomasks or reticles; data sets, recorded and downloadable, in the field of semiconductors; computer software, recorded, for operating semiconductor photomask or reticles optical inspection apparatus; computer software applications, downloadable, for operating semiconductor photomask or reticles optical inspection apparatus; computer hardware; computer programs, downloadable, for operating semiconductor photomask or reticles optical inspection apparatus

Optical inspection apparatus for semi-conductor materials and elements; confocal microscopes; semi-conductor testing machines and instruments; electron microscopes; differential interferometry detectors; testing apparatus not for medical purposes, namely, semiconductor testing apparatus; precision differential Interferometric measuring apparatus; data sets, downloadable, in the field of semiconductors; computer software, recorded, for controlling confocal microscopes; computer software applications, downloadable, for operating confocal microscopes; computer hardware; computer programs, downloadable, for recording images from confocal microscopes

Optical inspection apparatus for semi-conductor materials and elements; semiconductor wafer optical inspection apparatus; semiconductor wafer imaging apparatus, namely, optical imaging apparatus for semiconductor wafer; semi-conductor testing machines and instruments; electron microscopes; differential interferometry detectors; testing apparatus not for medical purposes, namely, semiconductor testing apparatus; precision crystallographic measuring apparatus; data sets, downloadable, in the field of semiconductors; computer software, recorded, for operating semiconductor wafer imaging apparatus, namely, optical imaging apparatus for semiconductor wafer; computer software applications, downloadable, for operating semiconductor wafer imaging apparatus, namely, optical imaging apparatus for semiconductor wafer; computer hardware; computer programs, downloadable, for operating semiconductor wafer imaging apparatus, namely, optical imaging apparatus for semiconductor wafer

Semiconductor photomask optical inspection apparatus; semiconductor reticle optical inspection apparatus; semiconductor photomask pattern optical inspection apparatus; semiconductor photomask pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor photomask pattern; semiconductor reticle pattern optical inspection apparatus; semiconductor reticle pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor reticle pattern

Defect repair machines for photomasks for semiconductors; defect repair machines for reticles for semiconductors; foreign matter removal machines for photomasks for semiconductors; foreign matter removal machines for reticles for semiconductors | Semiconductor photomask optical inspection apparatus; semiconductor photomask pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor photomask pattern; semiconductor reticle optical inspection apparatus; semiconductor reticle pattern measuring apparatus, namely, optical measurement system comprised of optical inspection apparatus for detection, measurement and cleaning of foreign matter and defects on semiconductor reticle pattern

Semiconductor photomask optical inspection apparatus; imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor photomasks; semiconductor reticle optical inspection apparatus; imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor reticles; semiconductor pellicle optical inspection apparatus; imaging apparatus, namely, optical imaging apparatus for inspection of semiconductor pellicles; optical inspection apparatus for semi-conductor materials and elements; semiconductor defect detectors; testing apparatus not for medical purposes, namely, semiconductor testing apparatus; precision measuring apparatus for defects of photomasks, reticles or pellicles; data sets, downloadable, in the field of semiconductors; computer software, recorded, for operating semiconductor photomasks, reticles or pellicles inspection apparatus; computer software applications, downloadable, for operating semiconductor photomasks, reticles or pellicles inspection apparatus; computer programs, downloadable, for operating semiconductor photomasks, reticles or pellicles inspection apparatus

Confocal scanning microscopes; optical inspection apparatus for industrial use for inspection of semiconductor materials, namely, photomasks and reticles silicon wafers and mask blanks in the nature of blank optical plate; phase-shift mask measurement system for photomask comprising optical measurement unit in the nature of optical measuring sensors, mask stages in the nature of optical stages for reflection and transmission measurements of flat substrates, electronic controller and computer; wafer inspection system comprised of optical inspection apparatus, wafer stages in the nature of stages for semiconductor wafers, electronic controller, and computer; wafer measurement system comprised of optical measurement apparatus, wafer stages in the nature of stages for semiconductor wafers, electronic controller and computer; substrate inspection system comprised of optical inspection apparatus, substrate stage in the nature of optical stages for reflection measurement of flat substrates, electronic controller, and computer; PV cell measurement system comprised of solar simulator, measurement unit in the nature of electronic sensors for measuring solar radiation, cell stages in the nature of stages for measurement of flat substrates, electronic controller and computer; coating thickness scanning system for lithium ion batteries comprised of coating thickness measuring gauge ; pellicle inspection apparatus in the nature of an optical inspection apparatus that inspects a pellicle film of a mask provided with a pellicle and used in EUV lithography

Class 009: Confocal scanning microscopes; optical inspection apparatus for industrial use, namely, photomask and reticle inspection apparatus, LCD color filter inspection system for silicon wafers and mask blanks, and thin film transister inspection apparatus; LCD color filter and TFT defect repair systems consisting primarily of tape grinding and film thermal transfer apparatus; phase-shift mask measurement systems for photomask comprising electronic-based instruments for measuring phase shift

scanning laser microscopes, and optical apparatus, namely, photomask/reticle/inspection apparatus, LCD color filter inspection system for photomask, reticle, wafer, maskblanks, LCD color filter and TFT (thin film transistor), LCD color filter repair system for LCD color filter and TFT

Optical Inspection equipment namely, Scanning Laser Microscopes and automatic Semi-Conductor Mask/Rectile Inspection System