SHIN-ETSU Trademark
SHIN-ETSU is a USPTO trademark filed by Shin-Etsu Chemical Co., Ltd.. Status: Registered.
Trademark Facts
| Mark | SHIN-ETSU |
|---|---|
| Serial Number | 79040672 |
| Registration Number | 3516613 |
| Status | Registered |
| Filing Date | 2007-03-28 |
| Registration Date | 2008-10-14 |
| Mark Type | Stylized |
| Nice Classes | 001 (Chemicals) |
| Owner | Shin-Etsu Chemical Co., Ltd. |
| Attorney of Record | Sang Eun Lee |
| Prosecution Events | 50 |
| Latest Event | NREP on 2026-01-22 |
Goods & Services
Chemicals for use in industry and science, namely, organosilanes; chemical emulsions for mold release agents, paper release agents and textile treatments; chemical antifoam agents for petrochemicals, food processing, fermentation, pharmaceutical use, paints, coatings, inks, paper, waste water treatment and textile; foaming control agents for controlling foam in urethane; mold release agents; paper release agents; textile treating agents; chemical additives for use in the manufacture of a variety of goods, namely, paint additives, additives for plastics, additives for cosmetics and toiletries; chemical based water repellants to be applied to building materials; coatings used in the manufacture of printed circuit boards, namely, silicone coatings for optical fibers, silanes, silane coupling agents; silicone coatings for junction of semiconductors; silicone adhesives, namely, adhesives for industrial use; catalysts for chemical reaction use; vinyl acetate monomer; vinyl chloride monomer; chemical epoxy encapsulating materials for semiconductors and optical devices; methanol; caustic soda; cellulose ethers; synthetic pheromones for use in the agriculture industry; silicon carbide; chemicals, namely, gallium phosphide for compound semiconductors used as light emitting element materials; chemicals, namely, aluminum gallium indium phosphide for compound semiconductors used as light emitting element materials; chemicals, namely, gallium arsenide for compound semiconductors used as light emitting element materials; photosensitive chemicals for semiconductor lithography; aroma chemicals, namely, chemicals for use in the manufacture of fragrances, fragrance ingredients and fragrance compounds; rare earth compounds; other chemicals for industrial use