GleanMark

ADVANCED SURFACE CREATION Trademark

ADVANCED SURFACE CREATION is a USPTO trademark filed by NITTA DUPONT INCORPORATED. Status: Registered.

Trademark Facts

MarkADVANCED SURFACE CREATION
Serial Number88588347
Registration Number6089093
StatusRegistered
Filing Date2019-08-22
Registration Date2020-06-30
Mark TypeWord
Nice Classes001 (Chemicals), 003 (Cosmetics), 007 (Machinery)
OwnerNITTA DUPONT INCORPORATED
Attorney of RecordHelen Hill Minsker
Prosecution Events21
Latest EventREM1 on 2025-06-30

Goods & Services

Work holding instruments for semiconductor wafer surface polishing machines and apparatus; templates for semiconductor wafer surface polishing machines and apparatus; blank components for semiconductor wafer surface polishing machines and apparatus; mounting films for semiconductor wafer surface polishing machines and apparatus; polishing pads for semiconductor wafer surface polishing machines and apparatus; conditioners used for polishing pads for semiconductor wafer surface polishing machines and apparatus; semiconductor wafer surface polishing machines and apparatus; parts and accessories of semiconductor wafer surface polishing machines and apparatus; semiconductor manufacturing machines and apparatus; work holding instruments for glass polishing machines and apparatus; templates for glass polishing machines and apparatus; blank templates for glass polishing machines and apparatus; mounting films for glass polishing machines and apparatus; polishing pads for glass polishing machines and apparatus; conditioners used for polishing pads for glass polishing machines and apparatus; glass polishing machines and apparatus; parts and accessories of glass polishing machines and apparatus; work holding instruments for glass substrate polishing machines and apparatus; templates for glass substrate polishing machines and apparatus; blank templates for glass substrate polishing machines and apparatus; mounting films for glass substrate polishing machines and apparatus; polishing pads for glass substrate polishing machines and apparatus; conditioners used for polishing pads for glass substrate polishing machines and apparatus; glass substrate polishing machines and apparatus; parts and accessories of glass substrate polishing machines and apparatus; work holding instruments for polishing machines and apparatus for manufacturing hard disks; templates for polishing machines and apparatus for manufacturing hard disks; blank templates for polishing machines and apparatus for manufacturing hard disks; mounting films for polishing machines and apparatus for manufacturing hard disks; polishing pads for polishing machines and apparatus for manufacturing hard disks; conditioners used for polishing pads for polishing machines and apparatus for manufacturing hard disks; polishing machines and apparatus for manufacturing hard disks; parts and accessories of polishing machines and apparatus for manufacturing hard disks; work holding instruments for electric polishing machines and apparatus; templates for electric polishing machines and apparatus; blank templates for electric polishing machines and apparatus; mounting films for electric polishing machines and apparatus; polishing pads for electric polishing machines and apparatus; conditioners used for polishing pads for electric polishing machines and apparatus; electric polishing machines and apparatus; parts and accessories of electric polishing machines and apparatus; Polishing pads; abrasive paper (sand paper); abrasive cloth; abrasive sand; polishing paper; polishing cloth; polishing preparations; semiconductor polishing slurries; electronic substrate polishing slurries; polishing slurries; abrasive preparations; Hydrophilic agents for industrial polishing; detergents for industrial use; chemicals; "ADVANCED SURFACE"

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