Soulbrain. Co., Ltd.

Highly Selective Etch Chemicals for use in the manufacture of semiconductors; Etch chemicals for use in the manufacture of semiconductors; Chemicals for use in industry, namely, silicon and silane compounds for use in the manufacture of semiconductors; hydrofluoric acids; Industrial chemicals, except for medical or veterinary use; Chemicals for use in industry, namely, silicon and silane compound; Phosphoric acid; Phosphoric acid compound; Industrial chemicals, namely, nitride film remover; Silanes; Acid etching solutions; Caustics for industrial purposes; Ammonium salts; Oxidizing agents; Strippers being industrial chemicals; Battery electrolytes

detergents for industrial use, namely, detergents for use in the manufacture of semiconductor; metal plating preparations, namely, chemicals for use in metal plating; Metal plating chemical compositions, namely, electrolytic acid copper solutions for use as semiconductor wiring materials; etching solutions for semiconductor manufacturing; fluorspar compounds used to make chemicals for semiconductor manufacturing

Chemicals used in industry and science; detergents for industrial use, namely, detergent for use in the manufacturing process; chemical preparations for use in industry; chemical additives for industrial purposes, namely, for use in the manufacture of semiconductors; chemical agents for removing acid in industrial manufacturing applications; metal plating preparations, namely, chemicals for use in metal plating; solutions for plating, namely, metal plating chemical compositions; chemical additives for plating baths; chemical solutions to be used as dopants for use in the manufacture of semi-conductors; etchants for use in the manufacture of semiconductors; etching solutions being acids for use in the manufacture of semiconductors; corrosive preparations, namely, for use in the manufacture of semiconductors; fluorine; hydrofluoric acid; oxidants being chemicals for use in the manufacture of semiconductors; strippers being chemicals for industrial purposes, namely, for use in the manufacture of semiconductors; etchants being chemicals for industrial purposes, namely, for use in the manufacture of semiconductors; electrolytes for ESS; electrolytes for batteries; electrolyte additives for lithium ion batteries

Chemicals used in industry and science; detergents for industrial use, namely, detergent for use in the manufacturing process; chemical preparations for use in industry; chemical additives for industrial purposes, namely, for use in the manufacture of semiconductors; chemical agents for removing acid in industrial manufacturing applications; metal plating preparations, namely, chemicals for use in metal plating; solutions for plating, namely, metal plating chemical compositions; chemical additives for plating baths; chemical solutions to be used as dopants for use in the manufacture of semi-conductors; etchants for use in the manufacture of semiconductors; etching solutions being acids for use in the manufacture of semiconductors; corrosive preparations, namely, for use in the manufacture of semiconductors; fluorine; hydrofluoric acid; oxidants being chemicals for use in the manufacture of semiconductors; strippers being chemicals for industrial purposes, namely, for use in the manufacture of semiconductors; etchants being chemicals for industrial purposes, namely, for use in the manufacture of semiconductors; electrolytes for ESS; electrolytes for batteries; electrolyte additives for lithium ion batteries

Chemicals used in industry and science; detergents for industrial use, namely, detergent for use in the manufacturing process; chemical preparations for use in industry; chemical additives for industrial purposes, namely, for use in the manufacture of semiconductors; chemical agents for removing acid in industrial manufacturing applications; metal plating preparations, namely, chemicals for use in metal plating; solutions for plating, namely, metal plating chemical compositions; chemical additives for plating baths; chemical solutions to be used as dopants for use in the manufacture of semi-conductors; etchants for use in the manufacture of semiconductors; etching solutions being acids for use in the manufacture of semiconductors; corrosive preparations, namely, for use in the manufacture of semiconductors; fluorine; hydrofluoric acid; oxidants being chemicals for use in the manufacture of semiconductors; strippers being chemicals for industrial purposes, namely, for use in the manufacture of semiconductors; etchants being chemicals for industrial purposes, namely, for use in the manufacture of semiconductors; electrolytes for ESS; electrolytes for batteries; electrolyte additives for lithium ion batteries

Chemicals used in industry and science; detergents for industrial use, namely, detergent for use in the manufacturing process; chemical preparations for use in industry; chemical additives for industrial purposes, namely, for use in the manufacture of semiconductors; chemical agents for removing acid in industrial manufacturing applications; metal plating preparations, namely, chemicals for use in metal plating; solutions for plating, namely, metal plating chemical compositions; chemical additives for plating baths; chemical solutions to be used as dopants for use in the manufacture of semi-conductors; etchants for use in the manufacture of semiconductors; etching solutions being acids for use in the manufacture of semiconductors; corrosive preparations, namely, for use in the manufacture of semiconductors; fluorine; hydrofluoric acid; oxidants being chemicals for use in the manufacture of semiconductors; strippers being chemicals for industrial purposes, namely, for use in the manufacture of semiconductors; etchants being chemicals for industrial purposes, namely, for use in the manufacture of semiconductors; electrolytes for ESS; electrolytes for batteries; electrolyte additives for lithium ion batteries

Caustic alkali; Caustic soda for industrial purposes; Dioxide of hydrogen for industrial use; [ Glycerine for industrial purposes; ] Chemical preparations for industrial or scientific purposes; Caustics for industrial purposes, namely, caustic soda; Industrial chemicals; Salts for industrial purposes, namely, magnesium salts; [ Acetates, being chemicals, for industrial purpose; ] Carbon black for industrial purposes; Perchlorates, namely, ammonium perchlorate; Silicon; Sodium salts as chemical preparations; Acid proof chemical compositions, namely, metal plating chemical compositions; Potassium Dioxalate; Anhydrides; [ Antifreezing agents, namely, antifreeze; Fluorine in the nature of fluorine resins; ] Fluorspar compounds; Hydrofluoric acid; [ Borax; ] Borates; Sorrel salt; Lithia, being lithium oxide; Chromium oxide; [ Salicylic acid for industrial uses; ] Aluminum hydrate; Calcium hydroxide; Hydrogen; Salts of alkaline metals; Alkalies; Alkaline-earth metals; Alcohol, namely, alcohol for industrial purposes; Ethyl alcohol; Ammonium salts for industrial purposes; [ Chemical preparations, except pigments, for the manufacture of enamel; ] Hydrochlorates; Chlorides, namely, aluminum chloride; Sal ammoniac; Oxalic acid; Iodic acid; [ Flocculants; ] Chemical preparations, namely, ion exchangers; Phosphoric acid; [ Automobile body fillers; Chemical additives to motor fuel; ] Battery anti-sulphurizing agents, namely, battery electrolytes; Detergents for use in manufacturing processes; Nitric acid; Nitrates, namely, iron nitrate; [ Hypochlorite of soda; ] Iron salts; Chemicals, namely, acetates; Calcium salts; Chemical reagents other than for medical or veterinary purposes; Bromine for chemical purposes; Sulphuric acid; [ Copper sulphate vitriol; ] Etchant for semiconductor manufacturing processes; Etchant for LCD manufacturing processes; Etchant for TFT-LCD manufacturing processes [; Thin films for semiconductor manufacturing; Nitride thin films; Epi-silicon thin films; Abrasive composition used in manufacture of semiconductor manufacturing processes; Electrolytes, namely, battery electrolytes ]