ASF-700
REGISTERED AND RENEWEDWord Mark
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Ownership
TO
Address
Kawasaki-shi
Kanagawa, 211-0012
JP
Critical Dates
First Use Date
Jan 16, 2007
Filing Date
Jun 24, 2014
Registration Date
Jan 19, 2016
Mark Descriptions
Goods
Class 1
Photographic materials, namely, photographic chemicals for shrinking photoresist patterns in a lithography process; industrial chemicals for shrinking photoresist patterns in a lithography process
Mark Elements
Text Mark
ASF-700
Category
Trademark
Standard Characters
No
Color Claim
No
Trademark Timeline
First Use
Filing Date
Publication Date
First Use in Commerce
Registration Date
USPTO Records
No documents found for this trademark.