AIXTRON SE logo

AIXTRON SE

19 Marks
Other
First Filed:Aug 4, 1983Latest Filed:Aug 26, 2024Address:Dornkaulstr. 2, Herzogenrath, 52134, DE

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Class 7
Machinery
14(74%)
Class 9
Electronics, Software & Scientific Equipment
3(16%)
Class 40
Material Treatment
1(5%)

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Trademark Activity Timeline(1983 – 2025)

Trademark Portfolio

21 results

(current & previous marks)

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Filed
Registered
Last Activity
HXP
HXP
Trademark
Word
REGISTERED
Owner:
Serial:79405875
Filed:Aug 26, 2024
Classes:7
Registration:7674504
Registered:Feb 4, 2025
Description: Machines for the production of semiconductors
HYPERION
HYPERION
Trademark
Word
REGISTERED
Owner:
Serial:79405876
Filed:Aug 26, 2024
Classes:7
Registration:7910279
Registered:Aug 26, 2025
Description: Reactor machines for the production of semiconductors, namely, industrial chemical vapor deposition reactors; the foregoing excluding industrial robots and robots for use in manufacture
MULTI-JECT
MULTI-JECT
Trademark
Word
REGISTERED
Owner:
Serial:79407993
Filed:Jul 26, 2024
Classes:7
Registration:7764723
Registered:Apr 22, 2025
Description: Machines for the production of semiconductors.
PLANETARY REACTOR
PLANETARY REACTOR
Trademark
Word
REGISTERED
Owner:
Serial:98473133
Filed:Mar 28, 2024
Classes:7
Registration:7854940
Registered:Jul 8, 2025
Description: Semiconductor manufacturing machines; Semiconductor wafer processing machines; Semiconductor wafer processing equipment
STEXS
STEXS
Trademark
Word
CANCELLED
Owner:
Serial:79227837
Filed:Dec 8, 2017
Classes:7
Registration:5730375
Registered:Apr 23, 2019
Description: Machines for the production of semiconductors; motors and engines, except for land vehicles; drive units for machines; parts of machines for operating semiconductor manufacturing machines
EXP
EXP
Trademark
Word
CANCELLED
Owner:
Serial:79207773
Filed:Jan 16, 2017
Classes:7
Registration:5343547
Registered:Nov 28, 2017
Description: Machines for the manufacture of semiconductors; machines for gas phase deposition; machines for the deposition of epitaxial films; machines for the manufacture of III-V compound semiconductors with at least one group III and at least one group V element including gallium arsenide semiconductors
EOS-XP
EOS-XP
Trademark
Word
ABANDONED
Owner:
Serial:79174852
Filed:Sep 8, 2015
Classes:7
Description: Machines for the manufacture or III-V or gallium arsenide transistors
PVPD
PVPD
Trademark
Word
CANCELLED
Owner:
Serial:79129344
Filed:Nov 26, 2012
Classes:40
Registration:4493081
Registered:Mar 11, 2014
GENUS
GENUS
Trademark
Combined
CANCELLED
Owner:
Serial:78828278
Filed:Mar 3, 2006
Classes:7
Registration:3253288
Registered:Jun 19, 2007
ATOMIC LEVEL SOLUTIONS
ATOMIC LEVEL SOLUTIONS
Trademark
Word
CANCELLED
Owner:
Serial:79024071
Filed:Jan 20, 2006
Classes:7
Registration:3376155
Registered:Jan 29, 2008
Description: Machines for manufacturing semiconductors and structural parts therefor
OVPD
OVPD
Trademark
Word
REGISTERED
Owner:
Serial:79006762
Filed:Sep 21, 2004
Classes:7
Registration:3055672
Registered:Jan 31, 2006
Description: Machines for manufacturing semiconductors and parts for such machines
TRILYNX
TRILYNX
Trademark
Word
CANCELLED
Owner:
Serial:79006678
Filed:Aug 9, 2004
Classes:7
Registration:3520716
Registered:Oct 21, 2008
Description: MACHINES FOR MANUFACTURING SEMICONDUCTORS AND STRUCTURAL PARTS THEREFOR
AIXACT
AIXACT
Trademark
Word
REGISTERED
Owner:
Serial:78299128
Filed:Sep 11, 2003
Classes:9
Registration:2906538
Registered:Nov 30, 2004
Description: CONTROL SYSTEM SOFTWARE FOR USE IN OPERATING CHEMICAL VAPOR DEPOSITION REACTORS THAT MANUFACTURE SEMI-AND SUPER-CONDUCTORS, OPERATING SYSTEM SOFTWARE FOR USE WITH CHEMICAL VAPOR DEPOSITION REACTORS THAT MANUFACTURE SEMI-AND SUPER-CONDUCTORS, COMPUTER SOFTWARE FOR USE IN PROGRAMMING THE CONTROL SYSTEM OF CHEMICAL VAPOR DEPOSITION REACTORS THAT MANUFACTURE SEMI-AND SUPER-CONDUCTORS | HANDBOOKS IN THE FIELD OF COMPUTER SOFTWARE FOR USE IN OPERATING CHEMICAL VAPOR DEPOSITION REACTORS THAT MANUFACTURE SEMI-AND SUPER-CONDUCTORS OR IN THE FIELD OF OPERATING SYSTEM SOFTWARE FOR USE WITH CHEMICAL VAPOR DEPOSITION REACTORS THAT MANUFACTURE SEMI-AND SUPER-CONDUCTORS OR IN THE FIELD OF COMPUTER SOFTWARE FOR USE IN PROGRAMMING THE CONTROL SYSTEM OF CHEMICAL VAPOR DEPOSITION REACTORS THAT MANUFACTURE SEMI-AND SUPER-CONDUCTORS
GAS FOIL ROTATION
GAS FOIL ROTATION
Trademark
Word
REGISTERED
Owner:
Serial:76199552
Filed:Jan 23, 2001
Classes:7
Registration:2597451
Registered:Jul 23, 2002
Description: Machines used to control chemical vapor
TRIJET
TRIJET
Trademark
Word
CANCELLED
Owner:
Serial:76092349
Filed:Jul 20, 2000
Classes:7
Registration:2720364
Registered:Jun 3, 2003
GAS FOIL ROTATION
GAS FOIL ROTATION
Trademark
Word
REGISTERED
Owner:
Serial:74391328
Filed:May 17, 1993
Classes:7
Registration:1876136
Registered:Jan 24, 1995
Description: Machines used to control chemical vapor deposition of solid state layers and coatings
PLANETARY REACTOR
PLANETARY REACTOR
Trademark
Word
REGISTERED
Owner:
Serial:74391731
Filed:May 17, 1993
Classes:9
Registration:1880227
Registered:Feb 21, 1995
Description: Laboratory apparatus used to control vapor deposition of solid state layers and coatings
AIXTRON
AIXTRON
Trademark
Word
REGISTERED
Owner:
Serial:73816503
Filed:Aug 2, 1989
Classes:11
Registration:1587642
Registered:Mar 20, 1990
Description: METAL ORGANIC VAPOR DEPOSITION EQUIPMENT, NAMELY, EPITAXIAL REACTORS, GAS HANDLERS [ AND EXHAUST GAS SCRUBBERS ]
GENUS
GENUS
Trademark
Word
CANCELLED
Owner:
Serial:73437795
Filed:Aug 4, 1983
Classes:9
Registration:1357692
Registered:Sep 3, 1985
Description: SEMICONDUCTOR PROCESSING EQUIPMENT, NAMELY FILM DEPOSITION AND REMOVAL UNITS, EMPLOYED BY THE SEMICONDUCTOR INDUSTRY IN THE FABRICATION OF INTEGRATED CIRCUITS AND THE LIKE
APEVA
APEVA
Trademark
Word
Previous
CANCELLED
Owner:
Serial:87599592
Filed:Sep 7, 2017
Classes:7
Registration:5457969
Registered:May 1, 2018
AVD
AVD
Trademark
Word
Previous
CANCELLED
Owner:
Serial:78178270
Filed:Oct 25, 2002
Classes:7, 9
Registration:2908197
Registered:Dec 7, 2004
Description: [ELECTRONIC SEMICONDUCTOR CONTROL, CHECKING AND MEASURING DEVICES, NAMELY, COMPUTER HARDWARE AND SOFTWARE FOR USE IN MEASURING, CHECKING AND CONTROLLING THE REFLECTIVITY OF GROWING WAFER SURFACES AND WAFER SURFACE TEMPERATURES OF INDIVIDUAL SEMICONDUCTOR WAFERS]; SEMICONDUCTOR MANUFACTURING MACHINES, NAMELY, CHEMICAL VAPOR DEPOSITION REACTORS AND COMPONENT PARTS OF CHEMICAL VAPOR DEPOSITION REACTORS, NAMELY, INJECTION APPARATUS AND INSTRUMENTS FOR LIQUID OR GASEOUS SUBSTANCES FOR THE MANUFACTURE OF SEMICONDUCTORS