Description: Ultrahigh vacuum components for scientific and research use, namely, monochromators and beam line components therefor, vacuum chambers, energy electron analyzers, electron beam deposition systems consisting of primary and high vacuum pumps, vacuum chambers, substrate holders, electron beam sources and XY sweep controls, electron cyclotron resonance systems consisting of primary and high vacuum pumps, vacuum chambers, substrate holders, electron cyclotron resonance sources and microwave power supplies, laser deposition systems consisting of primary and high vacuum pumps, vacuum chambers, substrate holders and laser power supplies, molecular beam epitaxy vacuum systems consisting of primary and high vacuum pumps, vacuum chambers, substrate holders, Knudsen cells and power supplies therefor, analytical systems consisting of primary and high vacuum pumps, vacuum chambers, substrate holders and surface analysis instrumentation for photoelectron, auger or secondary ion mass spectroscopy, load-lock and processing systems consisting of primary and high vacuum pumps, vacuum chambers, substrate holders and dedicated heating/cooling stages, linear motion devices, XYZ manipulators, rotary and linear drives, and swing ports; Design of scientific and research ultrahigh vacuum equipment for others, namely, magnetron coating systems, vacuum sublimation systems, hybrid sputtering and electron-beam evaporation systems, and thermal evaporation systems
