Oxford Instruments

Description: Apparatus and instruments for plasma deposition for manufacturing and processing semiconductors for plasma deposition and thermal growth for manufacturing and processing semiconductors; apparatus and instruments for manufacturing, processing and plasma treatment of semiconductor wafers, plastics or other materials; plasma cluster tools, all being laboratory apparatus and instruments; laboratory apparatus and instruments for plasma research; computer hardware and downloadable software for for the purpose of the control and operation of vapor deposition machines, plasma deposition and thermal growth machines, apparatus and instruments for thin film processing namely, atomic layer deposition tools, chemical vapour deposition tools, etch tools and cluster tools and flexible plasma processing apparatus for plasma etching and plasma deposition; replacement parts for the aforesaid goods; Vapor deposition machines for use in manufacturing semiconductors; plasma deposition and thermal growth machines for use in manufacturing semiconductors; apparatus and instruments for thin film processing namely, atomic layer deposition tools, chemical vapour deposition tools, etch tools and cluster tools; flexible plasma processing apparatus for plasma etching and plasma deposition

Description: Plasma etching machines; semiconductor processing machines for etching substrates; semiconductor processing machines for etching semiconductor wafers; robotic wafer handlers; robotic handling apparatus | Computer hardware and downloadable software for use in the field of wafers and semiconductor processing for the purpose of the control and operation of plasma etching machines, semiconductor processing machines for etching substrates, semiconductor processing machines for etching semiconductor wafers, robotic wafer handlers and robotic handling apparatus; laboratory apparatus and instruments for handling and plasma treatment of semiconductor wafers, plastics or other materials; plasma cluster tools, all being laboratory apparatus and instruments; laboratory plasma apparatus and instruments for use in research; replacement parts for the aforesaid goods

Description: Plasma etching machine tools for measurement; plasma etching machines; semiconductor processing machines for etching substrates; semiconductor processing machines for etching semiconductor wafers; robotic wafer handlers; robotic handling apparatus | Measurement apparatus for the semiconductor industry; computer hardware and downloadable software in the field of wafers and semiconductor processing for the purpose of the control and operation of plasma etching machines, semiconductor processing machines for etching substrates, semiconductor processing machines for etching semiconductor wafers, robotic wafer handlers and robotic handling apparatus; laboratory plasma apparatus and instruments for use in research; replacement parts for the aforesaid goods

Description: Recorded and downloadable computer control software for controlling and use in thin film production, the processing and coating of substrate structures, and plasma and ion beam processing; recorded and downloadable computer control software programmes for controlling and use in thin film production, the processing and coating of substrate structures, and plasma and ion beam processing; recorded and downloadable computer control software applications for mobile phones, portable media players, handheld computers, laptops and tablets, namely, software for controlling and use in thin film production, the processing and coating of substrate structures, and plasma and ion beam processing; recorded industrial process control software; recorded and downloadable control software for monitoring, controlling and running scientific and technical apparatus; recorded and downloadable computer control software for controlling and use in thin film production, the processing and coating of substrate structures, and plasma and ion beam processing in the field of science and technology; recorded and downloadable computer control software for controlling, collecting, processing, analyzing and monitoring data and signals

Description: Apparatus and instruments for thin film processing, namely, thin film processing machines; apparatus and instruments for thin film processing namely, power operated atomic layer deposition tools, power operated chemical vapour deposition tools, power operated etch tools and power operated cluster tools; apparatus and instruments for thin film processing namely, power operated atomic layer deposition tools, power operated etch tools and power operated cluster tools with automated handling; flexible ion beam processing systems for ion beam etching and ion beam deposition, namely, machines and machine tools for ion beam etching and deposition

Description: Apparatus and instruments for thin film processing, namely, atomic layer deposition tools for plasma atomic layer deposition, thermal atomic layer deposition, atomic layer epitaxy, etch tools for atomic layer etching and cluster tools for etching; apparatus and instruments for thin film processing, namely, atomic layer deposition tools for plasma atomic layer deposition, thermal atomic layer deposition, atomic layer epitaxy, etch tools for atomic layer etching and cluster tools for etching with automated handling

Description: Electron backscatter diffraction cameras; electron backscatter diffraction cameras used in relation to electron beam microscopes; electron backscatter diffraction cameras used in relation to ion beam microscopes; electron backscatter diffraction (EBSD) detectors for use in relation to electron microscopes; electron backscatter diffraction (EBSD) detectors for use in relation to ion beam microscopes

Description: Silicon drift detectors for X-ray analysis, not for medical use; silicon drift detectors for energy-dispersive X-ray spectroscopy, not for medical use; silicon drift detectors for wavelength dispersive X-ray spectroscopy, not for medical use

Description: Computer software for use with electron and ion-beam microscopes that uses the EDS (Energy Dispersive Spectroscopy) microanalysis technique to calculate the various film thicknesses and compositions that are present in a sample; computer software for measuring samples inside microscopes, including electron and ion-beam microscopes; computer software for processing X-ray data acquired from multi-layered samples inside an electron or ion-beam microscope to calculate the various film thicknesses and compositions that are present

Description: Apparatus and instruments in the field of plasma technology and semiconductor processing, plasma sources, sources for generating plasma, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber; apparatus and instruments for plasma generation, sources for generating ionized gas plasma, comprising scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber, creation of plasma via induction coupling; plasma research apparatus and instruments, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers; plasma cluster tools, namely, scientific apparatus comprising multiple plasma etching chambers sharing a common vacuum wafer loading module, all being laboratory apparatus and instruments; computer hardware and software for use in operating the aforesaid goods; structural parts and fittings for all the aforesaid goods

Description: Apparatus and instruments in the field of plasma technology and semiconductor processing, plasma sources, sources for generating plasma, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber; apparatus and instruments for plasma generation, sources for generating ionized gas plasma, comprising scientific instruments for the creation of plasma, scientific instruments used to ionise gas in a reaction chamber, creation of plasma via induction coupling; plasma research apparatus and instruments, namely, plasma etching apparatus comprising scientific instruments to ionise gas for the etching of silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers, scientific instruments used to etch silicon and semiconductor, conductor and insulating materials and semiconductor wafers and thin solid films on semiconductor wafers; plasma cluster tools, namely, scientific apparatus comprising multiple plasma etching chambers sharing a common vacuum wafer loading module, all being laboratory apparatus and instruments; computer hardware and software for use in operating the aforesaid goods; structural parts and fittings for all the aforesaid goods

Description: Apparatus and instruments for materials characterization and sample manipulation inside electron and ion-beam microscopes, namely, microanalysis X-ray detectors, and data acquisition and analytical software for Energy Dispersive Spectroscopy (EDS) and Wavelength Dispersive Spectroscopy (WDS), and detectors and data acquisition and analytical software for Electron Backscatter Diffraction (EBSD) analysis

Description: Laboratory apparatus and instruments for the exchange of substances and heat with regard to plasma technology and semiconductor processing; laboratory robots for handling semiconductor wafers; tool measuring instruments, namely, plasma cluster tools and plasma processing research apparatus; computer hardware and software for operating the foregoing