MIPOX
UnknownStylized Mark
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Key Information
Ownership
MC
Address
6F, Faret East Building
Tachikawa-shi, Tokyo, 190-0012
JP
Critical Dates
First Use Date
Aug 1, 2013
Filing Date
Sep 22, 2014
Registration Date
Jan 31, 2017
Mark Descriptions
Goods
Class 1
Detergents for use in manufacturing processes, namely, Substrate detergents for use in manufacturing processes of hard disks; chemical polishing slurry, namely, polishing slurry for use in magnetic hard disk substrate surfaces or semiconductor wafer surfaces | Polishing abrasive grain, namely...
Class 3
Detergents for use in manufacturing processes, namely, Substrate detergents for use in manufacturing processes of hard disks; chemical polishing slurry, namely, polishing slurry for use in magnetic hard disk substrate surfaces or semiconductor wafer surfaces | Polishing abrasive grain, namely...
Class 4
Detergents for use in manufacturing processes, namely, Substrate detergents for use in manufacturing processes of hard disks; chemical polishing slurry, namely, polishing slurry for use in magnetic hard disk substrate surfaces or semiconductor wafer surfaces | Polishing abrasive grain, namely...
Class 7
Detergents for use in manufacturing processes, namely, Substrate detergents for use in manufacturing processes of hard disks; chemical polishing slurry, namely, polishing slurry for use in magnetic hard disk substrate surfaces or semiconductor wafer surfaces | Polishing abrasive grain, namely...
Class 8
Detergents for use in manufacturing processes, namely, Substrate detergents for use in manufacturing processes of hard disks; chemical polishing slurry, namely, polishing slurry for use in magnetic hard disk substrate surfaces or semiconductor wafer surfaces | Polishing abrasive grain, namely...
Class 9
Detergents for use in manufacturing processes, namely, Substrate detergents for use in manufacturing processes of hard disks; chemical polishing slurry, namely, polishing slurry for use in magnetic hard disk substrate surfaces or semiconductor wafer surfaces | Polishing abrasive grain, namely...
Class 17
Detergents for use in manufacturing processes, namely, Substrate detergents for use in manufacturing processes of hard disks; chemical polishing slurry, namely, polishing slurry for use in magnetic hard disk substrate surfaces or semiconductor wafer surfaces | Polishing abrasive grain, namely...
Mark Elements
Text Mark
MIPOX
Category
Trademark
Standard Characters
No
Color Claim
No
Trademark Timeline
First Use
Filing Date
Publication Date
Registration Date
USPTO Records
No documents found for this trademark.