ESPACER
REGISTERED AND RENEWEDWord Mark
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Ownership
RH
Address
13-9, Shiba Daimon 1-chome, Minato-ku,
Tokyo, 22314
JP
Critical Dates
First Use Date
Jun 1, 1991
Filing Date
Oct 12, 1995
Registration Date
Mar 10, 1998
Mark Descriptions
Goods
Class 1
lithographic chemicals; chemicals for use in the manufacture of orientation films for liquid crystals; antistatic additives for use in the electric and electronic manufacturing industries
Class 2
lithographic chemicals; chemicals for use in the manufacture of orientation films for liquid crystals; antistatic additives for use in the electric and electronic manufacturing industries
Mark Elements
Text Mark
ESPACER
Category
Trademark
Standard Characters
Yes
Color Claim
No
Trademark Timeline
First Use
First Use in Commerce
Filing Date
Publication Date
Registration Date
USPTO Records
No documents found for this trademark.