PHOTOCLEAR
RegisteredWord Mark
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Ownership
TK
Address
1-1, Nihonbashi-muromachi 2-chome,, Chuo-ku Tokyo 103-8666, JP
Chuo-ku Tokyo 103-8666 1-1, Nihonbashi-Muromachi 2-chome,
JP
Critical Dates
First Use Date
Not filed yet
Filing Date
Mar 9, 2022
Registration Date
Mar 7, 2023
Mark Descriptions
Goods
Class 1
Chemicals used in industry; unprocessed artificial resins; chemical compositions for use in developing photographs; photosensitive polymer solution comprised of unprocessed polymer resins
Class 17
Insulating materials; insulating coatings; *electrical * insulating materials for * display * against light ; heat resistant insulating coatings
Mark Elements
Text Mark
PHOTOCLEAR
Category
Trademark
Standard Characters
Yes
Color Claim
No
Pseudo Mark
PHOTO CLEAR
Trademark Timeline
Filing Date
Publication Date
Registration Date
USPTO Records
No documents found for this trademark.