HIMASK
RegisteredWord Mark
Never miss important updates for HIMASK
Get alerts when status changes, similar marks are filed, or renewal deadlines approach
Ownership
Address
Room 303, No.1, Xingyuan Road, Tongcheng Economic and Technological Development Zone
Anqing, Anhui, 246000
CN
Critical Dates
First Use Date
Nov 16, 2021
Filing Date
Jun 26, 2025
Registration Date
Feb 3, 2026
Mark Descriptions
Goods
Class 9
Dust masks; Gas masks; Filters for respiratory masks for the prevention of accident or injury; Protective face masks for the prevention of accident or injury; Protective air purifying respirator masks for the prevention of accident or injury; Protective industrial face masks; Respiratory masks for the prevention of accident or injury
Mark Elements
Text Mark
HIMASK
Category
Trademark
Standard Characters
Yes
Color Claim
No
Pseudo Mark
HI MASK · HIGH MASK
Trademark Timeline
First Use
Filing Date
Publication Date
Registration Date
USPTO Records
No documents found for this trademark.