BAKER ALEG
REGISTERED AND RENEWEDWord Mark
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Ownership
AP
Address
Wilmington, DE 19808
Critical Dates
First Use Date
Mar 5, 1990
Filing Date
Nov 2, 1999
Registration Date
Jan 16, 2001
Mark Descriptions
Goods
Class 1
Industrial chemicals, namely, positive photo resist and residue remover for use in the manufacture of microcomputer chips
Mark Elements
Text Mark
BAKER ALEG
Category
Trademark
Standard Characters
Yes
Color Claim
No
Trademark Timeline
First Use
Filing Date
Publication Date
Registration Date
USPTO Records
No documents found for this trademark.