SEIMICRON
REGISTERED AND RENEWEDWord Mark
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Ownership
AI
Address
Tokyo, 100-8405
JP
Critical Dates
First Use Date
Jun 30, 2003
Filing Date
Jul 13, 2007
Registration Date
Apr 13, 2010
Mark Descriptions
Goods
Class 1
Grinding preparations, namely, liquids for industrial purposes; polishing preparations for industrial purposes; abrasives preparations for industrial purposes; scouring solutions for industrial purposes; Chemical mechanical polishing slurry with water-based solutions and abrasives for polishing semiconductor materials
Class 3
Grinding preparations, namely, liquids for industrial purposes; polishing preparations for industrial purposes; abrasives preparations for industrial purposes; scouring solutions for industrial purposes; Chemical mechanical polishing slurry with water-based solutions and abrasives for polishing semiconductor materials
Mark Elements
Text Mark
SEIMICRON
Category
Trademark
Standard Characters
No
Color Claim
No
Trademark Timeline
First Use
First Use in Commerce
Filing Date
Publication Date
Registration Date
USPTO Records
No documents found for this trademark.