ROTAM INNOVATION IN POST PATENT TECHNOLOGY
AbandonedCombined Mark
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Key Information
Ownership
RA
Address
Unit 6,26F Trend Centre,29 Cheung Lee St
Chai Wan
HK
Critical Dates
First Use Date
Not filed yet
Filing Date
Dec 29, 2012
Publication Date
Jun 11, 2013
Abandonment Date
Mar 14, 2016
Mark Descriptions
Goods
Class 1
"INNOVATION IN POST PATENT TECHNOLOGY"
Mark Elements
Text Mark
ROTAM INNOVATION IN POST PATENT TECHNOLOGY
Category
Trademark
Standard Characters
No
Color Claim
No
Drawing/Image Description
The mark consists of the words "ROTAM INNOVATION IN POST PATENT TECHNOLOGY" below a picture of a maple leaf surrounded by a headphone.
Design Search Codes
050303
160107
Disclaimer
"INNOVATION IN POST PATENT TECHNOLOGY"
Trademark Timeline
Filing Date
Publication Date
Abandonment Date
USPTO Records
No documents found for this trademark.