NANOBIX
SECTION 8-ACCEPTEDWord Mark
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Ownership
MK
Address
1-11-1 Osaki, Shinagawa-ku
Tokyo, 141-8584
JP
Critical Dates
First Use Date
Jun 20, 2011
Filing Date
Sep 7, 2017
Registration Date
Sep 11, 2018
Mark Descriptions
Goods
Class 1
Abrasive slurry for chemical mechanical polishing, namely, chemical slurries for polishing semiconductors; Abrasive slurry being chemical slurries for polishing semiconductors; Abrasive slurry for substrate; Abrasive slurry for semiconductor, namely, chemical slurries for polishing semiconductors
Mark Elements
Text Mark
NANOBIX
Category
Trademark
Standard Characters
No
Color Claim
No
Trademark Timeline
First Use
First Use in Commerce
Filing Date
Publication Date
Registration Date
USPTO Records
No documents found for this trademark.